Invention Grant
US08672977B2 Device and method for spinous process distraction 有权
用于棘突分离的装置和方法

  • Patent Title: Device and method for spinous process distraction
  • Patent Title (中): 用于棘突分离的装置和方法
  • Application No.: US12669794
    Application Date: 2008-08-11
  • Publication No.: US08672977B2
    Publication Date: 2014-03-18
  • Inventor: Tzony SiegalYinnon Elisha
  • Applicant: Tzony SiegalYinnon Elisha
  • Applicant Address: IL Kfar Saba
  • Assignee: NLT Spine Ltd.
  • Current Assignee: NLT Spine Ltd.
  • Current Assignee Address: IL Kfar Saba
  • Agent Mark M. Friedman
  • International Application: PCT/IB2008/053215 WO 20080811
  • International Announcement: WO2009/019669 WO 20090212
  • Main IPC: A61B17/70
  • IPC: A61B17/70
Device and method for spinous process distraction
Abstract:
An implant for maintaining a given minimum inter-spinous-process spacing includes an implant body with a number of segments hingedly interconnected so as to assume a straightened state for delivery along a conduit and a curved deployed state. An elongated tightening element is anchored at the distal segment of the implant body and passes along a channel extending along the implant body. Tension applied to the tightening element biases the implant body from the straightened state to the curved deployed state. Preferably, when the tightening element is deflected to reach the curved deployed state, a locking arrangement locks the tightening element relative to the implant body, thereby retaining the implant in the curved deployed state. A distal portion of the implant body is preferably formed with a set of lateral projections to inhibit withdrawal of the distal portion between adjacent spinous processes after deployment.
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