Invention Grant
- Patent Title: Flow rate control
- Patent Title (中): 流量控制
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Application No.: US12625194Application Date: 2009-11-24
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Publication No.: US08673144B2Publication Date: 2014-03-18
- Inventor: David W. Neyer , David J. Rakestraw , Jason E. Rehm
- Applicant: David W. Neyer , David J. Rakestraw , Jason E. Rehm
- Applicant Address: SG Singapore
- Assignee: DH Technologies Development Pte. Ltd.
- Current Assignee: DH Technologies Development Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agent Bella Fishman
- Main IPC: B01D15/08
- IPC: B01D15/08

Abstract:
A liquid sample is prepared at a preparation site and then processed, e.g. in an HPLC column. The sample is prepared and conveyed to the device at a flow rate which is substantially less than the flow rate through the device. The different flow rates are preferably provided by variable rate working fluid supplies which drive the sample from the preparation site and through the device.
Public/Granted literature
- US20100086443A1 Flow Rate Control Public/Granted day:2010-04-08
Information query