Invention Grant
- Patent Title: Double patterning compatible colorless M1 route
- Patent Title (中): 双重图案化兼容无色M1路线
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Application No.: US13646760Application Date: 2012-10-08
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Publication No.: US08677291B1Publication Date: 2014-03-18
- Inventor: Lei Yuan , Jongwook Kye , Mahbub Rashed , Qinglei Wang
- Applicant: Lei Yuan , Jongwook Kye , Mahbub Rashed , Qinglei Wang
- Applicant Address: KY Grand Cayman
- Assignee: GlobalFoundries Inc.
- Current Assignee: GlobalFoundries Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong Mori & Steiner, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for enabling functionality in circuit designs utilizing colorless DPT M1 route placement that maintains high routing efficiency and guarantees M1 decomposability of a target pattern and the resulting circuit are disclosed. Embodiments include: determining a boundary abutting first and second cells in an IC; determining a side of a first edge pin in the first cell facing a side of a second edge pin in the second cell; determining a first vertical segment of at least a portion of the side of the first edge pin and a second vertical segment of at least a portion of the side of the second edge pin; designating an area between the first vertical segment and the boundary as a first portion of a routing zone; and designating an area between the second vertical segment and the boundary as a second portion of the routing zone.
Public/Granted literature
- US20140097892A1 DOUBLE PATTERNING COMPATIBLE COLORLESS M1 ROUTE Public/Granted day:2014-04-10
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