Invention Grant
- Patent Title: Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
- Patent Title (中): 舞台装置和坐标校正方法相同，曝光装置和装置制造方法
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Application No.: US11584672Application Date: 2006-10-23
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Publication No.: US08681314B2Publication Date: 2014-03-25
- Inventor: Akimitsu Ebihara , Masato Takahashi
- Applicant: Akimitsu Ebihara , Masato Takahashi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2005-308326 20051024
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58 ; G03F7/20
Abstract:
A stage device includes a base, a movable table arranged above the base, a position information measurement device that measures position information of the movable table, a deformation amount detection unit that detects an amount regarding deformation of at least one of the base and the movable table, and a correction device that corrects the measured result of the position information measurement unit based on the detected result of the deformation amount detection unit.
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