Invention Grant
- Patent Title: Chemical bath deposition apparatuses and fabrication methods for chemical compound thin films
- Patent Title (中): 化学镀浴装置及化学复合薄膜的制造方法
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Application No.: US12890021Application Date: 2010-09-24
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Publication No.: US08683942B2Publication Date: 2014-04-01
- Inventor: Chung-Shin Wu , Pei-Sun Sheng , Wei-Tse Hsu
- Applicant: Chung-Shin Wu , Pei-Sun Sheng , Wei-Tse Hsu
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW99120394A 20100623
- Main IPC: B05C3/02
- IPC: B05C3/02 ; B05C3/18 ; B05C3/20

Abstract:
Chemical bath deposition (CBD) apparatuses and fabrication methods for compound thin films are presented. A chemical bath deposition apparatus includes a chemical bath reaction container, a substrate chuck for fixing a substrate arranged face-down toward the bottom of the chemical bath reaction container, multiple solution containers connecting to a reaction solution mixer and further connection to the chemical bath reaction container, and a temperature control system including a first heater controlling the temperature of the chemical bath reaction container, a second heater controlling the temperature of the substrate chuck, and a third heater controlling the temperature of the multiple solution containers.
Public/Granted literature
- US20110318493A1 CHEMICAL BATH DEPOSITION APPARATUSES AND FABRICATION METHODS FOR CHEMICAL COMPOUND THIN FILMS Public/Granted day:2011-12-29
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