Invention Grant
- Patent Title: Method for producing a microstructure
- Patent Title (中): 微结构的制造方法
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Application No.: US12809909Application Date: 2008-12-17
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Publication No.: US08685488B2Publication Date: 2014-04-01
- Inventor: Winfried Hoffmuller , Theodor Burchard , Marius Dichtl , Patrick Renner , Michael Rahm , Manfred Heim , Lars Hoffmann , Manfred Dotzler , Ralf Liebler , Mario Keller
- Applicant: Winfried Hoffmuller , Theodor Burchard , Marius Dichtl , Patrick Renner , Michael Rahm , Manfred Heim , Lars Hoffmann , Manfred Dotzler , Ralf Liebler , Mario Keller
- Applicant Address: DE Munich
- Assignee: Giesecke & Devrient GmbH
- Current Assignee: Giesecke & Devrient GmbH
- Current Assignee Address: DE Munich
- Agency: Lathrop & Gage LLP
- Priority: DE102007062089 20071221
- International Application: PCT/EP2008/010739 WO 20081217
- International Announcement: WO2009/083146 WO 20090709
- Main IPC: B41M3/14
- IPC: B41M3/14 ; B44F1/12

Abstract:
The present invention relates to a method for producing a micropattern on a substrate (22), in which a substrate (22) is provided with a relief pattern (26, 28) that exhibits elevations (26) and depressions (28), and in which the elevations (26) and/or depressions (26) are arranged in the form of the desired micropattern, and with a printing tool, an imprint material (30; 34) is transferred to the relief pattern (26, 28), the viscosity of the imprint material (30; 34) being chosen such that the imprint material (30; 34) is selectively transferred either substantially only onto the elevations (26) or substantially only into the depressions (28) of the relief pattern.
Public/Granted literature
- US20110045248A1 METHOD FOR PRODUCING A MICROSTRUCTURE Public/Granted day:2011-02-24
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