Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案的制造方法
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Application No.: US13552044Application Date: 2012-07-18
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Publication No.: US08685618B2Publication Date: 2014-04-01
- Inventor: Koji Ichikawa , Akira Kamabuchi
- Applicant: Koji Ichikawa , Akira Kamabuchi
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-157520 20110719
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38
Abstract:
A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I) and (B) an acid generator. wherein R1, A1, A13, X12, A14, R3 and ring X1 are defined in the specification.
Public/Granted literature
- US20130022910A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2013-01-24
Information query
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