Invention Grant
- Patent Title: Method of measuring a characteristic
- Patent Title (中): 测量特性的方法
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Application No.: US12711176Application Date: 2010-02-23
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Publication No.: US08685626B2Publication Date: 2014-04-01
- Inventor: Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
- Applicant: Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
Public/Granted literature
- US20100227280A1 Method of Measuring a Characteristic Public/Granted day:2010-09-09
Information query
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