Invention Grant
- Patent Title: Electronic device and method of manufacturing the same
- Patent Title (中): 电子设备及其制造方法
-
Application No.: US11856730Application Date: 2007-09-18
-
Publication No.: US08685796B2Publication Date: 2014-04-01
- Inventor: Yoichiro Kurita , Koji Soejima , Masaya Kawano
- Applicant: Yoichiro Kurita , Koji Soejima , Masaya Kawano
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Young & Thompson
- Priority: JP2006-271164 20061002
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
The electronic device includes a first interconnect layer and a second interconnect layer. The second interconnect layer is provided on the lower surface of the first interconnect layer. The first interconnect layer includes a via plug (first conductive plug). An end face of the via plug on the side of the second interconnect layer is smaller in area than the opposite end face. The via plug is exposed on the surface of the first interconnect layer facing the second interconnect layer. An insulating resin forming the first interconnect layer is higher in thermal decomposition temperature than an insulating resin forming the second interconnect layer.
Public/Granted literature
- US20080079157A1 ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2008-04-03
Information query
IPC分类: