Invention Grant
- Patent Title: Workpiece dividing method
- Patent Title (中): 工件分割方法
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Application No.: US13253563Application Date: 2011-10-05
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Publication No.: US08685839B2Publication Date: 2014-04-01
- Inventor: Kenji Furuta
- Applicant: Kenji Furuta
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2010-227851 20101007
- Main IPC: H01L21/78
- IPC: H01L21/78

Abstract:
In a semiconductor wafer with a supporting tape attached to the back side of the wafer, a coating member having a refractive index close to that of the supporting tape is formed on a pear-skin surface of the supporting tape to thereby planarize the pear-skin surface. Thereafter, a pulsed laser beam is applied from the upper side of the coating member to the semiconductor wafer in the condition where the focal point of the pulsed laser beam is set at a predetermined depth in the semiconductor wafer. Accordingly, the pulsed laser beam can be sufficiently focused inside the semiconductor wafer to thereby well form a modified layer inside the semiconductor wafer.
Public/Granted literature
- US20120088354A1 WORKPIECE DIVIDING METHOD Public/Granted day:2012-04-12
Information query
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