Invention Grant
- Patent Title: Solid-state imaging device, fabrication method thereof, imaging apparatus, and fabrication method of anti-reflection structure
- Patent Title (中): 固态成像装置及其制造方法，成像装置及防反射结构的制造方法
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Application No.: US12728448Application Date: 2010-03-22
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Publication No.: US08685856B2Publication Date: 2014-04-01
- Inventor: Kensaku Maeda , Kaoru Koike , Tohru Sasaki , Tetsuya Tatsumi
- Applicant: Kensaku Maeda , Kaoru Koike , Tohru Sasaki , Tetsuya Tatsumi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Dentons US LLP
- Priority: JP2009-086671 20090331; JP2009-121605 20090520
- Main IPC: H01L31/0236
- IPC: H01L31/0236
Abstract:
A fabrication method of an anti-reflection structure includes the steps of: forming a resin film having micro-particles dispersed therein on a surface of a substrate; forming a protrusion dummy pattern on the resin film by etching the resin film using the micro-particles in the resin film as a mask while gradually etching the micro-particles; and forming a protrusion pattern on the surface of the substrate by etching back the surface of the substrate together with the resin film having the protrusion dummy pattern formed thereon, and transferring a surface shape of the protrusion dummy pattern formed on a surface of the resin film to the surface of the substrate.
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