Invention Grant
- Patent Title: Coating liquid for forming low dielectric constant amorphous silica-based coating film and the coating film obtained from the same
- Patent Title (中): 用于形成低介电常数无定形二氧化硅基涂膜的涂布液和由其获得的涂膜
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Application No.: US12086745Application Date: 2006-12-15
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Publication No.: US08686101B2Publication Date: 2014-04-01
- Inventor: Miki Egami , Hiroki Arao , Akira Nakashima , Michio Komatsu
- Applicant: Miki Egami , Hiroki Arao , Akira Nakashima , Michio Komatsu
- Applicant Address: JP Kanagawa
- Assignee: JGC Catalysts and Chemicals Ltd.
- Current Assignee: JGC Catalysts and Chemicals Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2005-371017 20051222
- International Application: PCT/JP2006/325026 WO 20061215
- International Announcement: WO2007/072750 WO 20070628
- Main IPC: C08G77/08
- IPC: C08G77/08
Abstract:
A coating liquid for forming a low dielectric constant amorphous silica-based coating film with a dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, and also having a smooth surface with an excellent hydrophobicity. The coating liquid contains (1) a silicon compound obtained by hydrolyzing bis(trialkoxysilyl)alkane (BTASA) and alkoxysilane (AS) in the presence of tetraalkylammoniumhydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing bis(trialkoxysilyl)alkane (BTASA), alkoxysilane (AS) and tetraalkylorthosilicate (TAOS) in the presence of tetraalkylammoniumhydroxide (TAAOH).
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