Invention Grant
US08686342B2 Double-sided image sensor formed on a single semiconductor wafer die 有权
双面图像传感器形成在单个半导体晶片模具上

Double-sided image sensor formed on a single semiconductor wafer die
Abstract:
An example double-sided image sensor includes a semiconductor die, a photodetector, a charge-to-voltage converter, and support circuitry. The semiconductor die has a first side and a second side that is opposite the first side. The photodetector is disposed within the semiconductor die on the first side for accumulating an image charge in response to light incident on the first side. The charge-to-voltage converter is disposed within the semiconductor die on the first side. The transfer gate is also disposed on the first side of the semiconductor die between the photodetector and the charge-to-voltage converter to transfer the image charge from the photodetector to the charge-to-voltage converter. Support circuitry of the image sensor is disposed within the semiconductor die on the second side and is electrically coupled to the charge-to-voltage converter.
Public/Granted literature
Information query
Patent Agency Ranking
0/0