Invention Grant
US08686342B2 Double-sided image sensor formed on a single semiconductor wafer die
有权
双面图像传感器形成在单个半导体晶片模具上
- Patent Title: Double-sided image sensor formed on a single semiconductor wafer die
- Patent Title (中): 双面图像传感器形成在单个半导体晶片模具上
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Application No.: US13442562Application Date: 2012-04-09
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Publication No.: US08686342B2Publication Date: 2014-04-01
- Inventor: Xiao Ying Hong , Dominic Massetti
- Applicant: Xiao Ying Hong , Dominic Massetti
- Applicant Address: US CA Santa Clara
- Assignee: OmniVision Technologies, Inc.
- Current Assignee: OmniVision Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H03F3/08

Abstract:
An example double-sided image sensor includes a semiconductor die, a photodetector, a charge-to-voltage converter, and support circuitry. The semiconductor die has a first side and a second side that is opposite the first side. The photodetector is disposed within the semiconductor die on the first side for accumulating an image charge in response to light incident on the first side. The charge-to-voltage converter is disposed within the semiconductor die on the first side. The transfer gate is also disposed on the first side of the semiconductor die between the photodetector and the charge-to-voltage converter to transfer the image charge from the photodetector to the charge-to-voltage converter. Support circuitry of the image sensor is disposed within the semiconductor die on the second side and is electrically coupled to the charge-to-voltage converter.
Public/Granted literature
- US20130264467A1 DOUBLE-SIDED IMAGE SENSOR Public/Granted day:2013-10-10
Information query
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