Invention Grant
- Patent Title: Spin-torque magnetoresistive structures
- Patent Title (中): 自旋扭矩磁阻结构
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Application No.: US12475057Application Date: 2009-05-29
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Publication No.: US08686520B2Publication Date: 2014-04-01
- Inventor: Daniel Worledge
- Applicant: Daniel Worledge
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent Vazken Alexanian
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L29/82 ; G11C11/15 ; G11C11/16

Abstract:
Magnetoresistive structures, devices, memories, and methods for forming the same are presented. For example, a magnetoresistive structure includes a first ferromagnetic layer, a first nonmagnetic spacer layer proximate to the first ferromagnetic layer, a second ferromagnetic layer proximate to the first nonmagnetic spacer layer, and a first antiferromagnetic layer proximate to the second ferromagnetic layer. For example, the first ferromagnetic layer may comprise a first pinned ferromagnetic layer, the second ferromagnetic layer may comprise a free ferromagnetic layer, and the first antiferromagnetic layer may comprise a free antiferromagnetic layer.
Public/Granted literature
- US20100302690A1 Spin-Torque Magnetoresistive Structures Public/Granted day:2010-12-02
Information query
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