Invention Grant
US08686640B2 Magnetic field reduction apparatus and magnetic plasma flood system for ion beam processing
有权
用于离子束处理的磁场还原装置和磁等离子体淹水系统
- Patent Title: Magnetic field reduction apparatus and magnetic plasma flood system for ion beam processing
- Patent Title (中): 用于离子束处理的磁场还原装置和磁等离子体淹水系统
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Application No.: US13672871Application Date: 2012-11-09
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Publication No.: US08686640B2Publication Date: 2014-04-01
- Inventor: Michael Vella
- Applicant: E/G Electro-Graph Inc.
- Applicant Address: US CA Carlsbad
- Assignee: E/G Electro-Graph Inc.
- Current Assignee: E/G Electro-Graph Inc.
- Current Assignee Address: US CA Carlsbad
- Agent Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- Main IPC: H05H1/50
- IPC: H05H1/50
Abstract:
An ion beam processing system includes a plasma generator with a magnetic flood system. Magnets are provided for reducing the transverse magnetic field in the ion beam transport region of the plasma flood device so as to control charging damage or to neutralize beam space charge in ion beam processing and semiconductor ion implantation. The system is especially adapted for beam lines with ribbon beams.
Public/Granted literature
- US20130113378A1 MAGNETIC FIELD REDUCTION APPARATUS AND MAGNETIC PLASMA FLOOD SYSTEM FOR ION BEAM PROCESSING Public/Granted day:2013-05-09
Information query
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