Invention Grant
- Patent Title: Lithographic apparatus having an encoder position sensor system
- Patent Title (中): 光刻设备具有编码器位置传感器系统
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Application No.: US11802770Application Date: 2007-05-24
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Publication No.: US08687166B2Publication Date: 2014-04-01
- Inventor: Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
- Applicant: Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03B27/54 ; G03B27/68

Abstract:
A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
Public/Granted literature
- US20080291413A1 Lithographic apparatus having encoder type position sensor system Public/Granted day:2008-11-27
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