Invention Grant
- Patent Title: Imprint apparatus, detection method, article manufacturing method, and foreign particle detection apparatus
- Patent Title (中): 印刷装置,检测方法,制品制造方法和异物检测装置
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Application No.: US13354430Application Date: 2012-01-20
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Publication No.: US08687183B2Publication Date: 2014-04-01
- Inventor: Hiroshi Sato , Takanori Uemura
- Applicant: Hiroshi Sato , Takanori Uemura
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2011-014383 20110126; JP2011-284462 20111226
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
The present invention provides an imprint apparatus for performing an imprint process of transferring a pattern onto a substrate by curing a resin on the substrate while the resin is in contact with a mold, and removing the mold from the cured resin, including a detection unit configured to detect a foreign particle existing on the substrate, wherein the detection unit includes an obtaining unit configured to irradiate a surface of the substrate with light, and obtain light from the surface of the substrate, and a specification unit configured to specify a shot region where a foreign particle existing on the substrate is positioned, based on the light obtained by the obtaining unit.
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