Invention Grant
- Patent Title: Method and device for measuring motion error of linear stage
- Patent Title (中): 用于测量线性阶段运动误差的方法和装置
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Application No.: US13479933Application Date: 2012-05-24
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Publication No.: US08687200B2Publication Date: 2014-04-01
- Inventor: Sun-Kyu Lee , ChaBum Lee , Gyu Ha Kim
- Applicant: Sun-Kyu Lee , ChaBum Lee , Gyu Ha Kim
- Applicant Address: KR Buk-Gu, Gwangju
- Assignee: Gwangju Institute of Science and Technology
- Current Assignee: Gwangju Institute of Science and Technology
- Current Assignee Address: KR Buk-Gu, Gwangju
- Agency: Nath, Goldberg & Meyer
- Agent Joshua B. Goldberg
- Priority: KR10-2011-0056473 20110610
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01N21/86 ; G01V8/00 ; G01D5/36

Abstract:
Measurement of motion errors of a linear stage is performed to enable accurate measurement of motion errors in linear directions and a rotational direction in the linear stage using a diffraction grating. A first beam splitter splits a laser beam emitted from a light emitting unit. A first measurement unit measures a unidirectional linear motion error of the linear stage using one laser beam component split by the first beam splitter and a second measurement unit measures an angular motion error and another unidirectional linear motion of the linear stage error using a diffracted beam component obtained by diffracting another laser beam component split by the first beam splitter through the diffraction grating. A third measurement unit circularly polarizes the beam component diffracted through the diffraction grating to measure a third unidirectional linear motion error of the linear stage.
Public/Granted literature
- US20120314220A1 METHOD AND DEVICE FOR MEASURING MOTION ERROR OF LINEAR STAGE Public/Granted day:2012-12-13
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