Invention Grant
- Patent Title: Modeling the total parasitic resistances of the source/drain regions of a multi-fin multi-gate field effect transistor
- Patent Title (中): 建模多鳍多栅极场效应晶体管的源/漏区的总寄生电阻
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Application No.: US13455181Application Date: 2012-04-25
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Publication No.: US08689166B2Publication Date: 2014-04-01
- Inventor: Ning Lu
- Applicant: Ning Lu
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Gibb & Riley, LLC
- Agent Anthony J. Canale
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
In the embodiments, a full resistive network is used to determine resistance contributions to the total parasitic resistance of each source/drain region of a multi-fin multi-gate field effect transistor (MUGFET). These resistance contributions include: a first resistance contribution of end portions of the fins, which are connected in pseudo-parallel by a local interconnect; second resistance contributions of segments of the local interconnect, which are connected in pseudo-series; and any other resistance contributions of any other resistive elements between the end portions of the fins and a single resistive element through which all the diffusion region current flows. The multi-fin MUGFET is then represented in a netlist as a simple field effect transistor with the total parasitic resistances represented as single resistive elements connected to the source/drain nodes of that field effect transistor. This simplified netlist is then used to simulate performance of the multi-fin MUGFET.
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