Invention Grant
- Patent Title: Integrated circuit manufacturing system
- Patent Title (中): 集成电路制造系统
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Application No.: US12579303Application Date: 2009-10-14
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Publication No.: US08689434B2Publication Date: 2014-04-08
- Inventor: Hui-Chen Yang
- Applicant: Hui-Chen Yang
- Applicant Address: TW Taoyuan
- Assignee: Nanya Technology Corporation
- Current Assignee: Nanya Technology Corporation
- Current Assignee Address: TW Taoyuan
- Main IPC: B23P19/00
- IPC: B23P19/00

Abstract:
An ICs modeling manufacturing procedure is disclosed. A first pattern is printed on a first surface of a printed circuit board (PCB). The first pattern includes a first barcode and a plurality of production codes. A plurality of elements are disposed on the first surface of the PCB. The PCB is heated to fix the elements on the first surface and secure the first pattern on the first surface of the PCB. When the first pattern is read, a first production information is obtained.
Public/Granted literature
- US20110087359A1 INTEGRATED CIRCUITS MODELING MANUFACTURING PROCEDURE AND MANUFACTURING SYSTEM UTILIZING THE SAME Public/Granted day:2011-04-14
Information query