Invention Grant
- Patent Title: Alignment and imprint lithography
- Patent Title (中): 对准和压印光刻
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Application No.: US13510581Application Date: 2010-09-30
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Publication No.: US08691124B2Publication Date: 2014-04-08
- Inventor: Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant: Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2010/064607 WO 20100930
- International Announcement: WO2011/064020 WO 20110603
- Main IPC: B29C59/02
- IPC: B29C59/02 ; B29C59/16
Abstract:
An imprint lithography alignment apparatus is disclosed that includes at least two detectors which are configured to detect an imprint template alignment mark, wherein the alignment apparatus further comprises alignment radiation adjustment optics which are configured to provide adjustment of locations from which the at least two alignment detectors receive alignment radiation.
Public/Granted literature
- US20120225152A1 ALIGNMENT AND IMPRINT LITHOGRAPHY Public/Granted day:2012-09-06
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