Invention Grant
- Patent Title: Roll-to-roll imprint lithography and purging system
- Patent Title (中): 卷对卷压印光刻和清洗系统
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Application No.: US13015379Application Date: 2011-01-27
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Publication No.: US08691134B2Publication Date: 2014-04-08
- Inventor: Byung-Jin Choi
- Applicant: Byung-Jin Choi
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: B05D3/12
- IPC: B05D3/12

Abstract:
Droplets of polymerizable material may be patterned on a film sheet using a roll-to-roll system. The droplets of polymerizable material may be dispensed on the film sheet such that a substantially continuous patterned layer may be formed on the film sheet. A contact system provides for smooth fluid front progression the polymerizable material during imprinting. A gas purging system may be positioned during imprinting. Gas purging systems may provide for purging in parallel as fluid front of polymerizable material moves through roll-to-roll system.
Public/Granted literature
- US20110183070A1 ROLL-TO-ROLL IMPRINT LITHOGRAPHY AND PURGING SYSTEM Public/Granted day:2011-07-28
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