Invention Grant
US08691134B2 Roll-to-roll imprint lithography and purging system 有权
卷对卷压印光刻和清洗系统

  • Patent Title: Roll-to-roll imprint lithography and purging system
  • Patent Title (中): 卷对卷压印光刻和清洗系统
  • Application No.: US13015379
    Application Date: 2011-01-27
  • Publication No.: US08691134B2
    Publication Date: 2014-04-08
  • Inventor: Byung-Jin Choi
  • Applicant: Byung-Jin Choi
  • Applicant Address: US TX Austin
  • Assignee: Molecular Imprints, Inc.
  • Current Assignee: Molecular Imprints, Inc.
  • Current Assignee Address: US TX Austin
  • Agent Cameron A. King
  • Main IPC: B05D3/12
  • IPC: B05D3/12
Roll-to-roll imprint lithography and purging system
Abstract:
Droplets of polymerizable material may be patterned on a film sheet using a roll-to-roll system. The droplets of polymerizable material may be dispensed on the film sheet such that a substantially continuous patterned layer may be formed on the film sheet. A contact system provides for smooth fluid front progression the polymerizable material during imprinting. A gas purging system may be positioned during imprinting. Gas purging systems may provide for purging in parallel as fluid front of polymerizable material moves through roll-to-roll system.
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