Invention Grant
- Patent Title: Semiconductor device and penetrating electrode testing method
- Patent Title (中): 半导体器件和穿透电极测试方法
-
Application No.: US12926879Application Date: 2010-12-15
-
Publication No.: US08691601B2Publication Date: 2014-04-08
- Inventor: Mitsuaki Izuha
- Applicant: Mitsuaki Izuha
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rader, Fishman & Grauer PLLC
- Priority: JP2010-035350 20100219
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
Disclosed herein is a semiconductor device, including: a semiconductor substrate; an integrated circuit formed on a first main surface of the semiconductor substrate; a penetrating electrode that penetrates the semiconductor substrate in the thickness direction and has its one end electrically connected to the integrated circuit; a bump electrode formed on a second main surface of the semiconductor substrate and electrically connected to another end of the penetrating electrode; and a test pad electrode formed on the second main surface of the semiconductor substrate and electrically connected to the bump electrode.
Public/Granted literature
- US20110204357A1 Semiconductor device and penetrating electrode testing method Public/Granted day:2011-08-25
Information query