Invention Grant
US08691663B2 Methods of manipulating stressed epistructures 有权
操纵强调结构的方法

Methods of manipulating stressed epistructures
Abstract:
A method of processing an epistructure or processing a semiconductor device including associating a conformal and flexible handle with the epistructure and removing the epistructure and handle as a unit from the parent substrate. The method further includes causing the epistructure and handle unit to conform to a shape that differs from the shape the epistructure otherwise inherently assumes upon removal from the parent substrate. A device prepared according to the disclosed methods.
Public/Granted literature
Information query
Patent Agency Ranking
0/0