Invention Grant
US08691925B2 Compositions of neutral layer for directed self assembly block copolymers and processes thereof
有权
用于定向自组装嵌段共聚物的中性层组合物及其工艺
- Patent Title: Compositions of neutral layer for directed self assembly block copolymers and processes thereof
- Patent Title (中): 用于定向自组装嵌段共聚物的中性层组合物及其工艺
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Application No.: US13243640Application Date: 2011-09-23
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Publication No.: US08691925B2Publication Date: 2014-04-08
- Inventor: Hengpeng Wu , Yi Cao , SungEun Hong , Jian Yin , Margareta Paunescu , Mark O. Neisser , Guanyang Lin
- Applicant: Hengpeng Wu , Yi Cao , SungEun Hong , Jian Yin , Margareta Paunescu , Mark O. Neisser , Guanyang Lin
- Applicant Address: LU Luxembourg
- Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
- Current Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
- Current Assignee Address: LU Luxembourg
- Agent Sangya Jain
- Main IPC: C08F118/02
- IPC: C08F118/02 ; G03F7/20 ; C08L33/12

Abstract:
The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.
Public/Granted literature
- US20130078576A1 COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPOLYMERS AND PROCESSES THEREOF Public/Granted day:2013-03-28
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