Invention Grant
- Patent Title: Fluorine-containing compound purification method
- Patent Title (中): 含氟化合物的纯化方法
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Application No.: US13504335Application Date: 2010-10-26
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Publication No.: US08692038B2Publication Date: 2014-04-08
- Inventor: Hiromoto Ohno , Toshio Ohi , Katsutoshi Morinaka
- Applicant: Hiromoto Ohno , Toshio Ohi , Katsutoshi Morinaka
- Applicant Address: JP Tokyo
- Assignee: Showa Denko K.K.
- Current Assignee: Showa Denko K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-246633 20091027
- International Application: PCT/JP2010/068912 WO 20101026
- International Announcement: WO2011/052559 WO 20110505
- Main IPC: C07C17/38
- IPC: C07C17/38

Abstract:
There is provided a fluorine-containing compound purification method for obtaining a high-purity fluorine-containing compound by efficiently separating and removing hydrogen chloride from a fluorine-containing compound that contains hydrogen chloride, i.e., from a crude fluorine-containing compound. The fluorine-containing compound purification method of the present invention comprises the following steps (1) and (2) in this order: step (1): a step of adding dimethyl ether to a crude fluorine-containing compound that contains a fluorine-containing compound and hydrogen chloride in a molar ratio (dimethyl ether (mol)/hydrogen chloride (mol)) of dimethyl ether to hydrogen chloride being 1.3 or more to prepare a mixture (1) of the crude fluorine-containing compound and dimethyl ether; and step (2): a step of separating and removing a mixture (2) of hydrogen chloride and dimethyl ether from the mixture (1).
Public/Granted literature
- US20120215040A1 FLUORINE-CONTAINING COMPOUND PURIFICATION METHOD Public/Granted day:2012-08-23
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