Invention Grant
- Patent Title: Ion supply device and workpiece processing system provided with the same
- Patent Title (中): 离子供应装置和工件处理系统一样提供
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Application No.: US13871661Application Date: 2013-04-26
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Publication No.: US08692208B2Publication Date: 2014-04-08
- Inventor: Yudo Sugawara
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limted
- Current Assignee: Tokyo Electron Limted
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2010-164107 20100721
- Main IPC: H01L21/67
- IPC: H01L21/67

Abstract:
An ion supply device includes an ion generator for generating ions for removing static electricity, a carrier gas supply unit for supplying to the ion generator a carrier gas for carrying the ions generated in the ion generator, and an ion supply nozzle for blowing the ions and the carrier gas from the ion generator through a blow-off opening toward an electricity removal target from which static electricity is to be removed. A slit is provided at the blow-off opening and has an increased width as the slit gets distant from the electricity removal target. The ion supply nozzle includes an internal flow path and a plurality of internal fins provided at a portion of the internal flow path near the blow-off opening so that the ions and the carrier gas blown from the slit is uniformly distributed along a lengthwise direction of the slit.
Public/Granted literature
- US20130234035A1 ION SUPPLY DEVICE AND WORKPIECE PROCESSING SYSTEM PROVIDED WITH THE SAME Public/Granted day:2013-09-12
Information query
IPC分类: