Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US13173324Application Date: 2011-06-30
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Publication No.: US08692244B2Publication Date: 2014-04-08
- Inventor: Naoto Kaguchi , Norihisa Asano , Katsumi Sato
- Applicant: Naoto Kaguchi , Norihisa Asano , Katsumi Sato
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-240369 20101027
- Main IPC: H01L29/73
- IPC: H01L29/73

Abstract:
A semiconductor device includes: an emitter electrode formed of a silicide film, and provided on a semiconductor layer; an insulating film provided on the emitter electrode; and an electrode pad made of Al, and provided on the insulating film.
Public/Granted literature
- US20120104415A1 SEMICONDUCTOR DEVICE Public/Granted day:2012-05-03
Information query
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