Invention Grant
US08692305B2 Semiconductor devices and structures including at least partially formed container capacitors
有权
包括至少部分形成的容器电容器的半导体器件和结构
- Patent Title: Semiconductor devices and structures including at least partially formed container capacitors
- Patent Title (中): 包括至少部分形成的容器电容器的半导体器件和结构
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Application No.: US13286702Application Date: 2011-11-01
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Publication No.: US08692305B2Publication Date: 2014-04-08
- Inventor: Brett Busch , Kevin R. Shea , Thomas A. Figura
- Applicant: Brett Busch , Kevin R. Shea , Thomas A. Figura
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/94

Abstract:
Semiconductor device structures include an at least partially formed container capacitor having a generally cylindrical first conductive member with at least one inner sidewall surface, a lattice material at least partially laterally surrounding an upper end portion of the first conductive member, an anchor material, and at least one aperture extending through the lattice material between the at least partially formed container capacitor and an adjacent at least partially formed container capacitor. Other structures include an at least partially formed container capacitor, a lattice material, and an anchor material disposed over a surface of the lattice material and at least a portion of an end surface of the first conductive member and forming a chemical barrier over at least a portion of an interface between the lattice material and the upper end portion of the first conductive member.
Public/Granted literature
- US20120043596A1 SEMICONDUCTOR DEVICES AND STRUCTURES INCLUDING AT LEAST PARTIALLY FORMED CONTAINER CAPACITORS Public/Granted day:2012-02-23
Information query
IPC分类: