Invention Grant
US08692305B2 Semiconductor devices and structures including at least partially formed container capacitors 有权
包括至少部分形成的容器电容器的半导体器件和结构

Semiconductor devices and structures including at least partially formed container capacitors
Abstract:
Semiconductor device structures include an at least partially formed container capacitor having a generally cylindrical first conductive member with at least one inner sidewall surface, a lattice material at least partially laterally surrounding an upper end portion of the first conductive member, an anchor material, and at least one aperture extending through the lattice material between the at least partially formed container capacitor and an adjacent at least partially formed container capacitor. Other structures include an at least partially formed container capacitor, a lattice material, and an anchor material disposed over a surface of the lattice material and at least a portion of an end surface of the first conductive member and forming a chemical barrier over at least a portion of an interface between the lattice material and the upper end portion of the first conductive member.
Information query
Patent Agency Ranking
0/0