Invention Grant
- Patent Title: Transformer-coupled RF source for plasma processing tool
- Patent Title (中): 用于等离子体处理工具的变压器耦合射频源
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Application No.: US13251819Application Date: 2011-10-03
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Publication No.: US08692468B2Publication Date: 2014-04-08
- Inventor: Kamal Hadidi , Rajesh Dorai
- Applicant: Kamal Hadidi , Rajesh Dorai
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
A RF source and method are disclosed which inductively create a plasma within an enclosure without an electric field or with a significantly decreased creation of an electric field. A ferrite material with an insulated wire wrapped around its body is used to efficiently channel the magnetic field through the legs of the ferrite. This magnetic field, which flows between the legs of the ferrite can then be used to create and maintain a plasma. In one embodiment, these legs rest on a dielectric window, such that the magnetic field passes into the chamber. In another embodiment, the legs of the ferrite extend into the processing chamber, thereby further extending the magnetic field into the chamber. This ferrite can be used in conjunction with a PLAD chamber, or an ion source for a traditional beam line ion implantation system.
Public/Granted literature
- US20130082599A1 TRANSFORMER-COUPLED RF SOURCE FOR PLASMA PROCESSING TOOL Public/Granted day:2013-04-04
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