Invention Grant
US08692974B2 Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control
失效
使用通过远心控制的瞳孔填充的平版印刷设备和器件制造方法
- Patent Title: Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control
- Patent Title (中): 使用通过远心控制的瞳孔填充的平版印刷设备和器件制造方法
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Application No.: US11763274Application Date: 2007-06-14
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Publication No.: US08692974B2Publication Date: 2014-04-08
- Inventor: Johannes Jacobus Matheus Baselmans
- Applicant: Johannes Jacobus Matheus Baselmans
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03B27/54 ; G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/72
Abstract:
A method of measuring aberration present in a lithographic apparatus comprising the following steps. Modulating a radiation beam using a reflective patterning device. Projecting the radiation beam using a projection system. Detecting the projected radiation using a sensor. Measuring aberration via interference in the detected radiation beam. The radiation beam is tilted away from the optical axis of the projection system prior to entering the projection system.
Public/Granted literature
- US20080309898A1 Lithographic Apparatus and Device Manufacturing Method Using Pupil Filling By Telecentricity Control Public/Granted day:2008-12-18
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