Invention Grant
- Patent Title: Mask generation mechanism
- Patent Title (中): 面具生成机制
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Application No.: US13345456Application Date: 2012-01-06
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Publication No.: US08693054B2Publication Date: 2014-04-08
- Inventor: Kartheek Chandu , Mikel J. Stanich , Chai Wah Wu , Barry M. Trager
- Applicant: Kartheek Chandu , Mikel J. Stanich , Chai Wah Wu , Barry M. Trager
- Applicant Address: US CO Boulder
- Assignee: InfoPrint Solutions Company LLC
- Current Assignee: InfoPrint Solutions Company LLC
- Current Assignee Address: US CO Boulder
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H04N1/60
- IPC: H04N1/60
Abstract:
A method is disclosed. The method includes generating a seed pattern which ensures one dot per column, computing an auto correlation function and performing pixel error processing. Pixel error processing includes performing multiple operations during each iteration to create visually pleasing halftone mask patterns which follow a one dot per column constraint.
Public/Granted literature
- US20130176578A1 Mask Generation Mechanism Public/Granted day:2013-07-11
Information query
