Invention Grant
- Patent Title: Extreme UV radiation reflecting element comprising a sputter-resistant material
- Patent Title (中): 极紫外辐射反射元件包括抗溅射材料
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Application No.: US13000674Application Date: 2009-07-01
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Publication No.: US08693090B2Publication Date: 2014-04-08
- Inventor: Christof Metzmacher
- Applicant: Christof Metzmacher
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips N.V.
- Current Assignee: Koninklijke Philips N.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP08104648 20080707
- International Application: PCT/IB2009/052855 WO 20090701
- International Announcement: WO2010/004482 WO 20100114
- Main IPC: G02B5/08
- IPC: G02B5/08 ; G02B5/28
Abstract:
The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of ≦5 nm and essentially made out of a material with a sputter resistance of ≦10 nm per 108 shots and whereby the second layer is provided in the path of the incident and/or reflected EUV light.
Public/Granted literature
- US20110096428A1 EXTREME UV RADIATION REFLECTING ELEMENT COMPRISING A SPUTTER-RESISTANT MATERIAL Public/Granted day:2011-04-28
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