Invention Grant
- Patent Title: Apparatus and methods for vacuum-compatible substrate thermal management
- Patent Title (中): 真空兼容基板热管理的设备和方法
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Application No.: US12875720Application Date: 2010-09-03
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Publication No.: US08693856B2Publication Date: 2014-04-08
- Inventor: Jason Keith Rowan , Li-Min Chen , Roni Robinzon , Christopher Vreje Ohanian
- Applicant: Jason Keith Rowan , Li-Min Chen , Roni Robinzon , Christopher Vreje Ohanian
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: F24H1/34
- IPC: F24H1/34

Abstract:
One embodiment relates to an apparatus for vacuum-compatible substrate thermal management. The apparatus includes a load-lock chamber coupled to a vacuum chamber, a light-emitting diode array, and a substrate stage. The load-lock chamber is configured to hold a substrate prior to the substrate being transferred into the vacuum chamber, and a substrate stage is configured to hold the substrate in the vacuum chamber. The light-emitting diode array is configured to warm the substrate while the substrate is in the load-lock chamber. Other features, aspects and embodiments are also disclosed.
Public/Granted literature
- US20120057856A1 Apparatus and Methods for Vacuum-Compatible Substrate Thermal Management Public/Granted day:2012-03-08
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