Method and apparatus for providing a layout defining a structure to be patterned onto a substrate

Invention Grant

US08694930B2 Method and apparatus for providing a layout defining a structure to be patterned onto a substrate 有权

Title translation: 用于提供限定待图案化的结构的布局的方法和装置

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Patent Title: Method and apparatus for providing a layout defining a structure to be patterned onto a substrate
Patent Title (中): 用于提供限定待图案化的结构的布局的方法和装置
Application No.: US13208237

Application Date: 2011-08-11
Publication No.: US08694930B2

Publication Date: 2014-04-08
Inventor: Hanno Melzner
Applicant: Hanno Melzner
Applicant Address: DE Neubiberg
Assignee: Infineon Technologies AG
Current Assignee: Infineon Technologies AG
Current Assignee Address: DE Neubiberg
Agency: Slater & Matsil, L.L.P.
Main IPC: G06F17/50
IPC: G06F17/50

Method and apparatus for providing a layout defining a structure to be patterned onto a substrate

Abstract:

A method provides a layout defining a structure to be patterned onto a substrate. The structure is registered with a predefined grid of the layout. The method includes locally stretching the grid in a first portion of a layout causing a problematic spot on the substrate.

Abstract(Chinese):

一种方法提供了限定待图案化到衬底上的结构的布局。结构用布局的预定格网注册。该方法包括在布局的第一部分中局部拉伸格栅，从而在基板上产生有问题的斑点。

Public/Granted literature

US20130037915A1 Method and Apparatus for Providing a Layout Defining a Structure to be Patterned onto a Substrate Public/Granted day:2013-02-14

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