Invention Grant
- Patent Title: Cleaning method, cleaning apparatus
- Patent Title (中): 清洗方法，清洗装置
-
Application No.: US13422771Application Date: 2012-03-16
-
Publication No.: US08695145B2Publication Date: 2014-04-15
- Inventor: Yasuhito Yoshimizu , Hisashi Okuchi , Hiroshi Tomita
- Applicant: Yasuhito Yoshimizu , Hisashi Okuchi , Hiroshi Tomita
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JPP2011-175602 20110811
- Main IPC: B08B11/00
- IPC: B08B11/00 ; H01L21/304
Abstract:
Transferring plural semiconductor substrates under a state being held with predetermined intervals; holding the plural semiconductor substrates with roll brushes provided in plural pieces by each front side and back side of the plural semiconductor substrates, longitudinal directions of the roll brushes being oriented in parallel relative to the front side and the back side; and cleaning the plural semiconductor substrates by rotating the plural roll brushes.
Public/Granted literature
- US20130037055A1 CLEANING METHOD, CLEANING APPARATUS Public/Granted day:2013-02-14
Information query
IPC分类:
