Invention Grant
- Patent Title: Gas concentration control device for pressure vessel
- Patent Title (中): 压力容器用气体浓度控制装置
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Application No.: US13449479Application Date: 2012-04-18
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Publication No.: US08695623B2Publication Date: 2014-04-15
- Inventor: Horng Chih Horng
- Applicant: Horng Chih Horng
- Applicant Address: TW Hsinchu
- Assignee: Ableprint Technology Co., Ltd.
- Current Assignee: Ableprint Technology Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Rosenberg, Klein & Lee
- Priority: TW100214832U 20110810
- Main IPC: G05D11/00
- IPC: G05D11/00

Abstract:
A gas concentration control device for pressure vessel is provided for controlling gas concentration inside an accommodation space that is set in an interior of a chamber formed inside a pressure vessel curing oven. The pressure vessel curing oven includes a gas inlet tube with a first valve and a gas outlet tube with a second valve, which are in communication with the accommodation space. The gas concentration control device includes a gas concentration detection device, which is operative for timed detection of concentration of a gas inside the accommodation space, and a control unit for setting a predetermined concentration, performing a judgment if the gas concentration inside the accommodation space reaches the predetermined concentration according to a detection result of the gas concentration detection device, and thereby controls the first valve and the second valve according to result of the judgment.
Public/Granted literature
- US20130037126A1 GAS CONCENTRATION CONTROL DEVICE FOR PRESSURE VESSEL Public/Granted day:2013-02-14
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