Invention Grant
- Patent Title: Semiconductor cleaner systems and methods
- Patent Title (中): 半导体清洁剂系统和方法
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Application No.: US13531502Application Date: 2012-06-23
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Publication No.: US08696042B2Publication Date: 2014-04-15
- Inventor: Lutz Rebstock
- Applicant: Lutz Rebstock
- Applicant Address: DE Radolfzeil
- Assignee: DYNAMIC MICRO SYSTEM Semiconductor Equipment GmbH
- Current Assignee: DYNAMIC MICRO SYSTEM Semiconductor Equipment GmbH
- Current Assignee Address: DE Radolfzeil
- Agent Tue Nguyen
- Main IPC: B25J15/02
- IPC: B25J15/02 ; B25J15/08 ; H01L21/687

Abstract:
In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g.,
Public/Granted literature
- US20120328403A1 Semiconductor cleaner systems and methods Public/Granted day:2012-12-27
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