Invention Grant
- Patent Title: Contact and method for manufacturing the contact
- Patent Title (中): 联系人和制造接触的方法
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Application No.: US13264769Application Date: 2011-03-24
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Publication No.: US08696392B2Publication Date: 2014-04-15
- Inventor: Hitoshi Yoshida , Hidekazu Yoshioka , Takahiro Sakai , Yoshihiro Shimizu , Toshio Yamashita
- Applicant: Hitoshi Yoshida , Hidekazu Yoshioka , Takahiro Sakai , Yoshihiro Shimizu , Toshio Yamashita
- Applicant Address: JP Kyoto
- Assignee: OMRON Corporation
- Current Assignee: OMRON Corporation
- Current Assignee Address: JP Kyoto
- Agency: Osha Liang LLP
- Priority: JP2011-057075 20110315
- International Application: PCT/JP2011/057162 WO 20110324
- International Announcement: WO2012/124168 WO 20120920
- Main IPC: H01R13/02
- IPC: H01R13/02

Abstract:
A contact includes a plate with a width that ranges from 0.1 mm or more to 1 mm or less, and a stress concentrated place, where a surface roughness (Ra) on the stress concentrated place is 0.2 μm or less. When samples whose surface roughness Ra is 0.040 μm, 0.080 μm, 0.120 μm, and 0.180 μm were used to study a number of repetitive fracture times, as the surface roughness Ra was smaller, the number of repetitive fracture times became larger. Particularly, it is found that the surface roughness Ra may be 0.200 μm or less in order to satisfy 3000 times as a number of operating times of the battery connector. Further, the surface roughness Ra may be 0.080 μm or less in order to satisfy 6000 times as the number of operating times when a safety factor is 2.
Public/Granted literature
- US20120238158A1 CONTACT AND METHOD FOR MANUFACTURING THE CONTACT Public/Granted day:2012-09-20
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