Invention Grant
- Patent Title: Debris removal in high aspect structures
- Patent Title (中): 高层结构中的碎屑去除
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Application No.: US13652114Application Date: 2012-10-15
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Publication No.: US08696818B2Publication Date: 2014-04-15
- Inventor: Tod Evan Robinson , Bernabe J. Arruza , Kenneth Gilbert Roessler
- Applicant: Rave, LLC
- Applicant Address: US FL Delray Beach
- Assignee: Rave LLC
- Current Assignee: Rave LLC
- Current Assignee Address: US FL Delray Beach
- Agency: Baker & Hostetler LLP
- Main IPC: B08B7/00
- IPC: B08B7/00 ; B08B9/00
Abstract:
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.
Public/Granted literature
- US20130037053A1 Debris Removal in High Aspect Structures Public/Granted day:2013-02-14
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