Invention Grant
US08697021B2 Method for the production of HSiCl3 by catalytic hydrodehalogenation of SiCl4
失效
通过SiCl4的催化加氢脱卤制备HSiCl3的方法
- Patent Title: Method for the production of HSiCl3 by catalytic hydrodehalogenation of SiCl4
- Patent Title (中): 通过SiCl4的催化加氢脱卤制备HSiCl3的方法
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Application No.: US10586369Application Date: 2005-03-10
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Publication No.: US08697021B2Publication Date: 2014-04-15
- Inventor: Klaus Bohmhammel , Sven Koether , Gerhard Roewer , Ingo Roever , Jaroslaw Monkiewicz , Hans-Juergen Hoene
- Applicant: Klaus Bohmhammel , Sven Koether , Gerhard Roewer , Ingo Roever , Jaroslaw Monkiewicz , Hans-Juergen Hoene
- Applicant Address: DE Essen
- Assignee: Evonik Degussa GmbH
- Current Assignee: Evonik Degussa GmbH
- Current Assignee Address: DE Essen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102004019760 20040423
- International Application: PCT/EP2005/051081 WO 20050310
- International Announcement: WO2005/102928 WO 20051103
- Main IPC: C01B33/107
- IPC: C01B33/107
Abstract:
The invention relates to a process for the catalytic hydrodehalogenation of SiCl4 to form HSiCl3, which comprises bringing a gaseous feed mixture comprising hydrogen and silicon tetrachloride into direct contact with at least one heating element of a resistance heating device, with the heating element being composed of a metal or a metal alloy and being heated to carry out the reaction.
Public/Granted literature
- US20070173671A1 Method for the production of hsicl3 by catalytic hydrodehalogenation of sicl4 Public/Granted day:2007-07-26
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