Invention Grant
US08697317B2 Exposure apparatus for forming a reticle and method of forming a reticle using the same
有权
用于形成掩模版的曝光装置和使用其形成掩模版的方法
- Patent Title: Exposure apparatus for forming a reticle and method of forming a reticle using the same
- Patent Title (中): 用于形成掩模版的曝光装置和使用其形成掩模版的方法
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Application No.: US13564196Application Date: 2012-08-01
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Publication No.: US08697317B2Publication Date: 2014-04-15
- Inventor: Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
- Applicant: Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2011-0085039 20110825
- Main IPC: G03F1/20
- IPC: G03F1/20
Abstract:
A method including loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first and second pattern aperture so the first pattern aperture is overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam that passes the first pattern aperture to form a first exposure pattern; moving the second aperture plate so the second pattern aperture is overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after passing the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.
Public/Granted literature
- US20130052569A1 EXPOSURE APPARATUS FOR FORMING A RETICLE AND METHOD OF FORMING A RETICLE USING THE SAME Public/Granted day:2013-02-28
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