Invention Grant
US08697332B2 Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same
有权
基体发生剂,感光性树脂组合物,包含感光性树脂组合物的图案形成材料,使用该感光性树脂组合物的图案形成方法及包含该感光性树脂组合物的产品
- Patent Title: Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same
- Patent Title (中): 基体发生剂,感光性树脂组合物,包含感光性树脂组合物的图案形成材料,使用该感光性树脂组合物的图案形成方法及包含该感光性树脂组合物的产品
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Application No.: US13259586Application Date: 2010-03-26
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Publication No.: US08697332B2Publication Date: 2014-04-15
- Inventor: Mami Katayama , Shunji Fukuda , Katsuya Sakayori , Kouji Kawaguchi
- Applicant: Mami Katayama , Shunji Fukuda , Katsuya Sakayori , Kouji Kawaguchi
- Applicant Address: JP Tokyo-to
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo-to
- Agency: Ladas & Parry LLP
- Priority: JP2009-087617 20090331; JP2009-260753 20091116
- International Application: PCT/JP2010/055431 WO 20100326
- International Announcement: WO2010/113813 WO 20101007
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; G03F7/20 ; G03F7/30 ; G03F7/38

Abstract:
An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
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