Invention Grant
- Patent Title: Diffraction unlimited photolithography
- Patent Title (中): 衍射无限光刻
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Application No.: US13078485Application Date: 2011-04-01
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Publication No.: US08697346B2Publication Date: 2014-04-15
- Inventor: Robert R. McLeod , Christopher N. Bowman , Timothy F. Scott , Amy C. Sulivan
- Applicant: Robert R. McLeod , Christopher N. Bowman , Timothy F. Scott , Amy C. Sulivan
- Applicant Address: US CO Denver
- Assignee: The Regents of the University of Colorado
- Current Assignee: The Regents of the University of Colorado
- Current Assignee Address: US CO Denver
- Agency: Maschoff Brennan
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20

Abstract:
Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed.
Public/Granted literature
- US20120092632A1 DIFFRACTION UNLIMITED PHOTOLITHOGRAPHY Public/Granted day:2012-04-19
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