Invention Grant
- Patent Title: Manufacturing method of a light-emitting device
- Patent Title (中): 发光装置的制造方法
-
Application No.: US13358869Application Date: 2012-01-26
-
Publication No.: US08697463B2Publication Date: 2014-04-15
- Inventor: Chih-Hui Alston Liu , Tsung-Pao Yeh , Chang Yi-Cheng , Liao Chuen-Min
- Applicant: Chih-Hui Alston Liu , Tsung-Pao Yeh , Chang Yi-Cheng , Liao Chuen-Min
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing a light-emitting device includes steps of: providing a light-emitting wafer including an upper surface and a lower surface opposite to the upper surface; setting a plurality of scribing streets on the upper surface of the light-emitting wafer; irradiating a laser beam to form a plurality of cutting regions along the scribing streets, wherein each of the plurality of cutting regions has a sharp end, or the plurality of cutting regions forms a specific pattern in a cross-sectional view; and forming a plurality of light-emitting devices by connecting the plurality of cutting regions and extending the plurality of cutting regions from the respective sharp ends thereof to the lower surface of the light-emitting wafer.
Public/Granted literature
- US20130196461A1 MANUFACTURING METHOD OF A LIGHT-EMITTING DEVICE Public/Granted day:2013-08-01
Information query
IPC分类: