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US08697549B2 Deposition of porous films for thermoelectric applications 有权
沉积用于热电应用的多孔膜

Deposition of porous films for thermoelectric applications
Abstract:
An improved method of creating thermoelectric materials which have high electrical conductivity and low thermal conductivity is disclosed. In one embodiment, the thermoelectric material is made by depositing a porous film onto a substrate, introducing a dopant into the porous film and annealing the porous film to activate the dopant. In other embodiments, additional amounts of dopant may be introduced via subsequent ion implantations of dopant into the deposited porous film.
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