Invention Grant
- Patent Title: Charged particle beam drawing apparatus and article manufacturing method
- Patent Title (中): 带电粒子束拉制装置及制品的制造方法
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Application No.: US13343752Application Date: 2012-01-05
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Publication No.: US08698095B2Publication Date: 2014-04-15
- Inventor: Ichiro Tanaka , Akira Miyake , Hiromitsu Takase
- Applicant: Ichiro Tanaka , Akira Miyake , Hiromitsu Takase
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2011-001991 20110107
- Main IPC: G21K5/04
- IPC: G21K5/04

Abstract:
The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.
Public/Granted literature
- US20120178025A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING METHOD Public/Granted day:2012-07-12
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