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US08698099B2 Attraction member, and attraction device and charged particle beam apparatus using the same 有权
吸引构件，吸引装置和使用其的带电粒子束装置

  • Patent Title: Attraction member, and attraction device and charged particle beam apparatus using the same
  • Patent Title (中): 吸引构件，吸引装置和使用其的带电粒子束装置
  • Application No.: US12894382
    Application Date: 2010-09-30
  • Publication No.: US08698099B2
    Publication Date: 2014-04-15
  • Inventor: Tetsuya Inoue
  • Applicant: Tetsuya Inoue
  • Applicant Address: JP Kyoto
  • Assignee: Kyocera Corporation
  • Current Assignee: Kyocera Corporation
  • Current Assignee Address: JP Kyoto
  • Agency: Volpe and Koenig, P.C.
  • Priority: JP2009-226246 20090930; JP2009-226247 20090930; JP2010-220892 20100930; JP2010-220893 20100930
  • Main IPC: G21G5/00
  • IPC: G21G5/00 ;  B23B31/30
Attraction member, and attraction device and charged particle beam apparatus using the same
Abstract:
A chucking member for holding a target is removably mounted on a chucking stage with a plurality of vacuum holes. the chucking member has a substrate removably mounted on the chucking stage. The substrate has a vacuum region in which the target being to be arranged, the vacuum region allowing gas to be vacuumed through a part of the plurality of the vacuum holes, and a vacuum inhibition region provided around the vacuum region, the vacuum inhibition region covering the other of the vacuum holes to inhibit the gas from being vacuumed through the other of the vacuum holes.
Abstract(Chinese):

用于保持目标的夹紧构件可拆卸地安装在具有多个真空孔的夹紧台上。 夹持构件具有可拆卸地安装在夹紧台上的基板。 所述基板具有要设置所述靶的真空区域，允许气体通过所述多个所述真空孔的一部分被抽真空的真空区域和设置在所述真空区域周围的真空抑制区域，所述真空抑制区域覆盖 另一个真空孔用于阻止气体被另一个真空孔抽真空。

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