Invention Grant
- Patent Title: Chamber apparatus and extreme ultraviolet (EUV) light generation apparatus including the chamber apparatus
- Patent Title (中): 包括室装置的室内装置和极紫外（EUV）光发生装置
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Application No.: US13696517Application Date: 2011-12-13
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Publication No.: US08698113B2Publication Date: 2014-04-15
- Inventor: Masato Moriya , Osamu Wakabayashi
- Applicant: Masato Moriya , Osamu Wakabayashi
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-019024 20110131
- International Application: PCT/IB2011/003027 WO 20111213
- International Announcement: WO2012/104669 WO 20120809
- Main IPC: H05G2/00
- IPC: H05G2/00
Abstract:
A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.
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