Invention Grant
- Patent Title: Method for producing a plasma beam and plasma source
- Patent Title (中): 用于制造等离子体束和等离子体源的方法
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Application No.: US12765252Application Date: 2010-04-22
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Publication No.: US08698400B2Publication Date: 2014-04-15
- Inventor: Michael Scherer , Jurgen Pistner
- Applicant: Michael Scherer , Jurgen Pistner
- Applicant Address: DE
- Assignee: Leybold Optics GmbH
- Current Assignee: Leybold Optics GmbH
- Current Assignee Address: DE
- Agency: Cantor Colburn LLP
- Main IPC: H05B31/26
- IPC: H05B31/26

Abstract:
A plasma source generates a plasma beam that is extracted from a plasma generated by electric and magnetic fields. An RF electrode device includes an excitation electrode having an excitation area, and a plasma space is arranged between extraction electrode and excitation area. The plasma, relative to the extraction electrode is at a higher potential which accelerates positive plasma ions, and the plasma and the extracted plasma beam are influenced by a magnetic field. At least one magnet north pole and one magnetic south pole generate the magnetic field. Each are arranged such that a curved magnetic field projecting into the interior of the plasma space is formed. At least one of the north or south poles is embodied in elongate fashion to form a tunnel-like region in the plasma, in which charged particles are held and along which the latter can propagate.
Public/Granted literature
- US20110068691A1 METHOD FOR PRODUCING A PLASMA BEAM AND PLASMA SOURCE Public/Granted day:2011-03-24
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